Electron beam lithography E-beam Multibeam Mapper
<p>Jan 30, 2013 08:43 PM
 
SLOW!    takes a v long time to expose an entire wafer or glass substrate.
leaves user vulnerable to beam drift or instability!
 
secondary electrons are a problem (to avoid, keep energy low)
 
drilling material is v inefficient... requires long exposure times.
 
signif interest in multi beam litho  but wud need 10M parallel to be competitive.</p>