LBNL Berkeley SHARP Microscope EUV Litho Mask
<p>Nov 04, 2011 10:56 AM
 
(Note: this IS a microscope...  can be used to LOOK at a litho mask to detect
tiny defects and dust particles at a stage where they can be repaired.
 
from US  D of Energy  at  LBNL
 
world's most advanced EUV scope.
 
Kenneth Goldberg  CXRO.
 
Berkelely ALS  Advanced Light Source.
 
will replace existing scope by late 2012  EUV  photomark-imaging scope.
 
EUV... every material absorbs it.
 
<b>SHARP will exceed its performance in every metric: </b>
<b>resolution, speed, uniformity of illumination, and coherence control</b>. 
 
SHARP will enable forward-looking research years before commercial tools become available.
 
Within a few years, semiconductor devices will be measured in dimensions of <b>16, 11, or 8 nanometers</b>,
 
 mere billionths of a meter. To mass-produce them, <b>industry is pushing a photolithography</b> process t
hat uses<b> EUV light with a wavelength of just 13.5 nanometers, 40 times smaller than visible light</b>.
“At this short wavelength, we can print and image circuit patterns at nanometer length scales,” says Goldberg.
 
 “The new microscope will leverage years of cutting-edge EUV and soft-x‑ray microscopy experience, experimental systems-engineering at CXRO, and EUV optics expertise developed as part of the lithography research programs here.” Goldberg says that the ALS, as one of the world’s brightest sources of EUV light, “is a great place to develop EUV lithography technologies.”
 
 </p>