2014 Adlyte Actinic Inspection EUV’s Second Source

<p>Jul 24, 2015 09:41 PM &nbsp;Best explanation of <b>Actinic Inspection</b> and its probs..

this is excellent! &nbsp;Required reading...</p>

<p>

note: &nbsp;EUV will not pass thru anything... so NO lenses!

and the MASKS themselves must be mirrored (ie reflective) and not stencils.</p>

<p>

article is from Nov 2014...</p>

<p>

this is from the EE journal.</p>

<p>

HVM = &nbsp;high volume manufac &nbsp;(has its own TLA = three letter abbrev)...

cuz its NOT a science project.</p>

<p>

Masks and wafers need to be inspected.</p>

<p>

MASKS must be defect free.</p>

<p>

WAFERS ... need to make sure they are not born with defects and do not acquire them during processing.</p>

<p>

inspections are not done manually.</p>

<p>

what light do you shine; like a crime scene... look for blood using UV.</p>

<p>

a defect on the mask, creates a defect on the wafer... must find it!</p>

<p>

must inspect under the same light as being used in litho... eg &nbsp;&nbsp;must use EUV.

that is ACTINIC INSPECTION.</p>

<p>

note: &nbsp;EUV will not pass thru anything... so NO lenses!

and the MASKS themselves must be mirrored (ie reflective) and not stencils.</p>

<p>

AIMS is &nbsp;Aerial Image Metrology System... (like a hologram)

patent Carl Zeiss... hidden behind NDAs.</p>

<p>

Adlyte: &nbsp;&nbsp;v close to being ready for HVM.

goal tin cartridge lasts 3 to 5 days.</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>

<p>

&nbsp;</p>