Mark Phillips Intel EUVLitho Workshop June 2015

<p>Jul 21, 2015 06:55 PM</p>

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his powerpoint deck... &nbsp;&nbsp;54 slides.</p>

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slide 22: how will EV be used at intro?</p>

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slide 42: &nbsp;EUV infrastructure: &nbsp;8 key programs;

two are green (ready); &nbsp;4 are in dev and 2 have signif gaps. (inspection and multi-layer deposition)</p>

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slide &nbsp;47: &nbsp;explains &nbsp;PWI = patterned wafer inspection to detect repeating defects...</p>

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slide 52: &nbsp;high res inspection &nbsp;(is about 1 nm res)

must inspect 800 mm2 in < 4 hours.</p>

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slide 53: Conclusions: &nbsp;&nbsp;2 years olf solid progress on EUVL... &nbsp;can achieve high productivity</p>

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but sill concerns abt availability and stability.</p>

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and note: mask-related infrastructure is in danger of limiting used of EUVL in HVM.</p>