2014 Source Workshop Proceedings
<p>Nov 30, 2014 06:24 PM</p>
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many great papers... just held in Ireland.</p>
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Mark Phillips Intel session 1 keynote:</p>
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see Wim van der Zande ASML keynote: 4 Nov 2014:</p>
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see multi-patterning complexity drives need for EUV:
33 masks vs 9 masks at 7 nm</p>
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goal is 250 watts = 125 wafers per hour with 4.5% conv effic CO2 drive laserl</p>
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2 customers demo 500 wafer per day capability;</p>
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EUV pellicle success. 85.5% transmission!</p>
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80 watt demo at ASML being xfer out.</p>
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