Pre-Pulse Technology for EUV Lithography
<p>Feb 06, 2013 11:25 AM
 
Dan Brown  Tech Dev Officer in San Diego
 
published Nov 19 2012
 
how to get enuf power....
 
wph  = wafers per hour;
 
pre-pulse...  v signif  devel.
 
 
30 micron diameter droplets;
velocity > 100 mph...
pulse width < 1 microsecond;
 
plasma  >  500K  Celsius...
 
 
need to match the tin taget size with the beam size
 
beam size is much bigger than droplet...  hard to get beam smaller...
 
pre-pulse:  2 laser beams
 
takes small droplet... distort into thin plate target...
 
much better matched geometr. to main laser beam...
much more efficient....
 
 </p>